Our Advanced Lithography section has recently seen a new addition: the Voyager Electron Beam Lithography system by RAITH.
It is a high-performance, ergonomic and entirely automated system that allows to pattern high-resolution structures in the nanometer range on samples with a wide range of sizes.
Some of its features are: 50 kV beam acceleration, 500 µm write field size with sub-8 nm features, automatic focus and stigmator setup, automated write field calibration.
Possible applications are in the fields of photonics, optics and optoelectronics (e.g. metalens structures, waveguides, …), among many others.
Soon it will be available for user training, upon reasonable request.
