Wet Bench Lithography – SPM

Details

Manufacturer
SPM
Contact person
Chiara Nava, Andrea Scaccabarozzi
Location

Description:

The bench is equipped with one rinse tank, one heated process tank (not in use), one N2 and one DI-H2O spray guns.

Working principle

This bench is used for development of substrates in lithography processes.

Specifications

Supplied with DI Water at 18 MOhm

Do you have any question on this equipment?