EBL System – Raith Voyager

The VOYAGER is a dedicated high-performance electron beam lithography system that allows sub-10 nm features to be written on a wide range of sample sizes.

It is entirely automated and ultra-ergonomic, and equipped with an environment-tolerant shield that ensures system stability.

The VOYAGER integrates faithful EBL electron optics along with new innovations in pattern generator design that make automated system calibrations and batch fabrication possible.

Unique writing modes with auto-focus/auto-stigmator/auto stage adjustment enable stitching-error-free patterns.

Electron beam lithography is a direct-write patterning technique in which a highly focussed electron beam is moved over a sample following a CAD design.

The sample is covered with an electron sensitive film (resist) deposited by spin-coating: the electron beam induces a change in the molecular structure and thus the solubility of the resist film.
Development in a suitable solvent then selectively dissolves the exposed (or unexposed) areas of the resist and allows pattern transfer via etching or deposition.

The main advantage of EBL with respect to optical lithography is the higher spatial resolution (below 10 nm).

• Accelerating voltage: ≤ 50 kV
• Beam current: ≤ 40 nA
• Sample size: from 5×5 mm pieces to 8″ wafers
• Stage travel: 150 x 150 x 20 mm (XYZ)
• Writing field size: 500 x 500 um
• Patterning resolution: < 10 nm
• Overlay/stitching accuracy: < 25 nm
• Writing speed: > 1 cm²/hour

Other features:

• 50MHz digital pattern generator
• Automatic focus and stigmator setup
• Automatic switch between high-resolution and high-throughput writing modes
• Fully automated write field calibration
• Laser interferometer monitoring and piezo actuators for ultra-fine stage control
• Laser height sensing for on-the-fly focus correction during exposure