Lithography

EBL System – Raith Voyager

RAITH

Two-Photon 3D Printer – Nanoscribe Quantum X Shape

Nanoscribe

Laser Writer – Heidelberg DWL66+

Heidelberg Instruments

Maskless Aligner – Heidelberg MLA100

Heidelberg Instruments

Mask Aligner – Karl Süss MA6/BA8

Karl Süss

NanoFrazor Explore

Heidelberg Instruments

Spin Module with Hot Plate – Sawatec SM-200/HP-200duo

Sawatec

Developer Module – SAWATEC SMD-200

Sawatec

Spin Coater – Karl Süss RC8

Karl Süss

Spin Coater – Sawatec SM-150

Sawatec

Hot Plate – Sawatec HP401

Sawatec

Plasma Asher – PVA TEPLA 300 AL

PVA TePla AG

Optical Microscope – Zeiss Axio Imager.A2 Vario

Zeiss

Optical Microscope – Leica INM 200

Leica

UV Exposure Box – PoliFAB

PoliFAB’s Staff

Wet Bench Solvents – SPM

SPM

Wet Bench Development – SPM

SPM

Wet Bench Lithography – Robotank

Robotank

Wet Bench Lithography – SPM

SPM

Spin Rinser Dryer – Semitool

Semitool

Other areas

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