Cleanroom Equipment
Our cleanroom includes an ISO 6 area of 330 m2 with facilities for optical lithography, electron beam lithography, wet and dry etching, thin film deposition and metrological characterization and an ISO 8 area of 290 m2 equipped with facilities for back-end, testing, thermal treatments and advanced depositions.
We can process several different types of substrates (silicon, glass, plastic, etc…) and sizes from small pieces to 8-inch wafers.
Take a tour through our technological capabilities.
